- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/36 - Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
Patent holdings for IPC class G03F 1/36
Total number of patents in this class: 948
10-year publication summary
|
59
|
72
|
78
|
86
|
109
|
105
|
109
|
92
|
99
|
27
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
214 |
| ASML Netherlands B.V. | 6816 |
133 |
| Samsung Electronics Co., Ltd. | 131630 |
95 |
| D2s, Inc. | 150 |
43 |
| Synopsys, Inc. | 2829 |
40 |
| United Microelectronics Corp. | 3921 |
35 |
| Siemens Industry Software Inc. | 1633 |
23 |
| International Business Machines Corporation | 60644 |
21 |
| Intel Corporation | 45621 |
20 |
| Changxin Memory Technologies, Inc. | 4732 |
16 |
| Csmc Technologies Fab2 Co., Ltd. | 664 |
13 |
| GLOBALFOUNDRIES U.S. Inc. | 6459 |
12 |
| Semiconductor Manufacturing International (Shanghai) Corporation | 1764 |
12 |
| Kioxia Corporation | 9847 |
11 |
| Canon Inc. | 36841 |
8 |
| Dai Nippon Printing Co., Ltd. | 3891 |
8 |
| KLA-Tencor Corporation | 2574 |
8 |
| Semiconductor Manufacturing International (Beijing) Corporation | 1019 |
8 |
| Micron Technology, Inc. | 24960 |
7 |
| Lam Research Corporation | 4775 |
7 |
| Other owners | 214 |